出版社：Centre for Studies in Social Justice, University of Windsor
摘要：In 2017 and 2018 [Name of research project] organized two transnational youth resistance art workshops. These workshops addressed online social justice issues and placed emphasis on pushing back against technology-facilitated violence and surveillance in networked spaces. Our engagement with these workshops raised three dilemmas associated with these sorts of resistive social justice art projects. This article explores these dilemmas, which include how to enable the production of digital art in a manner that is attentive to intersectional issues of digital literacy and access; artistic appropriations of sexually explicit, discriminatory or hateful speech and their relation to cultural appropriation; and defamation, privacy, copyright and trademark considerations relating to artistic appropriations. In addressing these dilemmas, examples of regulatory frameworks shaping resistance opportunities and social justice initiatives are highlighted, along with suggestions for addressing these dilemmas for those who may wish to facilitate or engage in youth resistance art workshops in future.
其他关键词：privacy; inequality; technology; art; self-expression; digital; social justice; art activism; copyright
