文章基本信息
- 标题:DUV Optical Wafer Inspection System for 65-nm Technology Node
- 本地全文:下载
- 作者:Kenji Watanabe ; Shunji Maeda ; Tomohiro Funakoshi 等
- 期刊名称:Hitachi Review
- 印刷版ISSN:0018-277X
- 出版年度:2005
- 卷号:54
- 期号:1
- 出版社:Hitachi Ltd
- 关键词:wafer inspection; defect inspection; bright field; optical inspection; DUV laser