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  • 标题:Mechanism of SOS mutagenesis of UV-irradiated DNA: mostly error-free processing of deaminated cytosine
  • 本地全文:下载
  • 作者:I Tessman ; S K Liu ; M A Kennedy
  • 期刊名称:Proceedings of the National Academy of Sciences
  • 印刷版ISSN:0027-8424
  • 电子版ISSN:1091-6490
  • 出版年度:1992
  • 卷号:89
  • 期号:4
  • 页码:1159-1163
  • DOI:10.1073/pnas.89.4.1159
  • 语种:English
  • 出版社:The National Academy of Sciences of the United States of America
  • 摘要:We measured the kinetics of growth and mutagenesis of UV-irradiated DNA of phages S13 and lambda that were undergoing SOS repair; the kinetics strongly suggest that most of SOS mutagenesis arises from the deamination of cytosine in cyclobutane pyrimidine dimers, producing C----T transitions. This occurs because the SOS mechanism bypasses T--T dimers promptly, while bypass of cytosine-containing dimers is delayed long enough for deamination to occur. The mutations are thus primarily the product of a faithful mechanism of lesion bypass by a DNA polymerase and are not, as had been generally thought, the product of an error-prone mechanism. All of these observations are explained by the A-rule, which is that adenine nucleotides are inserted noninstructionally opposite DNA lesions.
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