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  • 标题:Cell Stability Analysis of Conventional 6T Dynamic 8T SRAM Cell in 45NM Technology
  • 本地全文:下载
  • 作者:K. Dhanumjaya ; M. Sudha ; MN.Giri Prasad
  • 期刊名称:International Journal of VLSI Design & Communication Systems
  • 印刷版ISSN:0976-1527
  • 电子版ISSN:0976-1357
  • 出版年度:2012
  • 卷号:3
  • 期号:2
  • 出版社:Academy & Industry Research Collaboration Center (AIRCC)
  • 摘要:A SRAM cell must meet requirements for operation in submicron/nano ranges. The scaling of CMOS technology has significant impact on SRAM cell -- random fluctuation of electrical characteristics and substantial leakage current. In this paper we present dynamic column based power supply 8T SRAM cell and comparing the proposed SRAM cell with respect to conventional SRAM 6T in various aspects. To verify read stability and write ability analysis we use N-curve metric. Simulation results affirmed that proposed 8T SRAM cell achieved improved read stability, read current, and leakage current in 45nm Technology comparing with conventional 6T SRAM using cadence virtuoso tool
  • 关键词:SRAM; Leakage Current; N-curve; Read stability; Write-ability; Cadence; Virtuoso; 45nm Technology.
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